CVD Equipment Corporation (CVD) completed renovations at its new headquarters in New York earlier this month and is now moving into the purpose built facility.
The company held a ribbon-cutting ceremony on Thursday March 14, with distinguished guests followed by an open house for all interested visitors.
For CVD, a designer and manufacturer of custom and standard state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials and coatings for research and industrial applications, the move enables the company to take the next step forward in its growth strategy.
Leonard Rosenbaum, president and CEO, stated, “It has taken longer than expected, but the new facility will now enable the company to continue our growth. The new facility is over twice the size of our old facility and is laid out in a more productive working environment.”
“The new facility allows us to bring under one roof our CVD/First Nano equipment manufacturing, Application Laboratory and CVD Materials Corporation.”
CVD’s headquarters are now located at 355 South Technology Drive, Central Islip, New York 11722.
CVD Equipment Corporation has revealed its first set of results since moving to its new facility and headquarters, with revenue and earnings for the year ending December 31, 2012 understandably reflecting the transition.
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