Air Products’ Chemical Mechanical Planarization (CMP) slurries were recently cleared in a patent infringement litigation case in Arizona.

The CMP slurries are produced and sold by DuPont Air Products NanoMaterials, LLC (DA NanoMaterials) and were not found in breach of Cabot Microelectronics’ patents. A jury reached the decision on 18th June at the United States District Court for the District of Arizona.

Seng Wui Lim, Chief Executive Officer at DA NanoMaterials, commented, “We are extremely pleased with the jury’s conclusion that DA NanoMaterials’ tungsten CMP slurries do not infringe Cabot’s patents. The ruling reinforces the fact that our products are vastly different from Cabot’s and enables us to continue to aggressively pursue future business growth regarding these products.“

He added, “We remain committed to delivering innovative products, and will continue to compete in the marketplace worldwide while providing our customers with superior technology and service.”

During the court ruling, the appellate Korean Patent Court declared Cabot’s tungsten CMP Korean patent as invalid. This comes in addition to three similar findings at the Seoul District Court, the appellate Korean High Court and the Korean Intellectual Property Tribunal.