With the need for functional water supplies in products in the electronics industry ever escalating, the development and sales of hydrogen water generators have been rapidly expanding.
A supply of gas for the production of functional hydrogen water is used largely through the process of water-electrolysis generators, providing an efficient and environmentally-friendly cleaning solution for the production of semiconductors and LCD's.
There is advancing use of functional water which dissolves hydrogen and ozone as well as carbon dioxide, in pure water for cleaning semiconductors and liquid crystal substrates. The search had been on for new alternative methods, as chemical cleaning processes emit large quantities of chemical as well as the pure water used to rinse them and is no longer viable within tighter environmental regulations.
Functional waters such as ozone, hydrogen and carbon dioxide waters emerged, with the functional capabilities of cleaning and removing metal and organic materials with special oxidizability and reduction capacity. Waster water treatment is not required because after cleaning, the gas comes out at one point, resulting in clean water. This method is being rapidly introduced into the semiconductor and LCD industries, as the amount of water consumed at the plants can be decreased and water treatment costs significantly reduced.
Kurita Water Industries and Organo, as well as Nomura Micro Science, are involved in the production of hydrogen water generators and ozone water generators, for the supply of functional water. For the past several years their sales have been greatly expanding, with increases of 20 percent over the previous year.
Mr Morita of Kurita Water Industries, the largest Japanese producer of ultrapure water for use in the electronics industry, commented, $quot;for us, the fact is that by using functional water our water business shrink. Taking the environmental aspect into consideration, functional water then becomes very important.$quot;