Air Products announces improved High-K Films at 10th International Conference on Atomic Layer Deposition in Seoul, South Korea.
Dr Laura Matz, the Technical Manager for Advanced Memory Materials at Air Products, presented a paper entitled, “Control of Strontium Titanate Films for Next Generation DRAM” and also announced the company’s latest sector offerings.
The company offered a description of new Strontium and Titanium Precursors, alongside an update regarding the progress of manufacturable delivery methods. The latest releases came in response to the need for larger data capacity chips.
The EXTREMA® STO Precursors have undergone evaluation with integrated capacitor structures and are capable of achieving the target dielectric constants needed for 2x nm and further technology nodes. Matz remarked, “By electrically testing the films deposited from Air Products Sr and Ti precursors; we were able to prove that our precursors are viable for the next generation of DRAM based on key electrical metrics.”
Matz continued, “Typically metalorganic precursors can be very challenging to deliver reliably. As part of our high-k precursors development program, we have established a test platform that enables us to study all aspects of chemical delivery in details. We are committed to providing products that address the challenges our customers face in developing this next generation of DRAM capacitors.”