New gas abatement solutions from BOC Edwards


BOC Edwards has announced the launch of a new family of ATLAS gas abatement solutions for semiconductor manufacturers.

The ATLAS systems meet the industry’s need for three process-related abatement problems: ATLAS TCS addresses the common CVD gases, ATLAS TPU addresses PFC gases in CVD and etch processes, and ATLAS Kronis addresses the low-k CVD gases in next-generation processes.

The new ATLAS system consumes half the fuel of previous-generation gas abatement systems, significantly reducing running costs. It features one to six inlets with a number of options, including a temperature management system, and a flow capacity of up to 600slm. It also offers enhanced ease-of-use and is more efficient to maintain.

$quot;The ATLAS system is based on the previous-generation technology that customers worldwide have come to trust for performance, reliability, and safety; yet the ATLAS system offers improvements in operating costs, maintenance requirements and ease of use,$quot; said Jerome Boegner, exhaust gas management product manager (Asia), BOC Edwards. $quot;We’ve taken 12 years of field experience with the TCS, TPU, and Kronis products and have improved them with the family of new ATLAS systems.$quot;

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