Vacuum technology expert Pfeiffer Vacuum (Pfeiffer) has released its new multi-stage Roots pump ACP 90, a ‘robust’ pump designed for oil and particle-free applications between atmospheric pressure up to 3×10-2 hPa (hectopascal).
Resistant to applications with light corrosive gases, the pumps are suitable for uses involving drying, sterilisation, coating, in addition to semiconductor and R&D applications.
Commenting on the new release, Jean-Philippe Briton, Product Manager, Pfeiffer, said, “We are particularly proud of the built-in intelligence that allows for high pumping speed at high pressure, which is important when pumping large volumes.”
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