Swagelok, an Ohio-based solutions provider of fluid system products, assemblies, and related services, has released a new ultrahigh-purity (UHP) valve for high-flow applications.

The new ALD20 valve is the latest result of Swagelok’s collaboration with semiconductor tool manufacturers and chip fabricators, allowing forward-thinking process designers the flexibility to experiment with low-vapor pressure chemistries.

ALD20

Source: Swagelok

“The ALD20 is a direct response to the rapidly evolving needs of the semiconductor industry,” said Garrick Joseph, Director of Marketing, Semiconductor for Swagelok.

“Through partnership with industry leaders and application of fluid system engineering expertise, we are pleased to launch a product that allows customers to effectively use precursor gas chemistries that previously may have been considered too challenging or too expensive to employ, but which would be crucial to the development of the next generation of chip technology.” 

The ALD20’s patent-pending design maximises production process efficiency and deposition consistency by providing flow coefficients two and three times what can be achieved using today’s standard ALD valve technology. 

It can deliver a flow rate of up to 1.2 Cv in the same footprint (1.5 inches) as existing ALD valves, allowing some users to boost throughput without retooling existing equipment or making additional process changes.

The other standard version ALD20 valve with a slightly larger footprint width (1.75 inches) provides an even greater flow rate of up to 1.7Cv. Custom set flow coefficients are also available.

Designed for peak process consistency, the ALD20 can be fully immersible in a gas box from 10°C (50°F) and up to 200°C (392°F), enhancing thermal stability and deposition uniformity.

It also features a valve body comprised of 316L VIM-VAR stainless steel or Alloy 22 – offering enhanced corrosion resistance to withstand aggressive media.

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