Taiyo Nippon Sanso Corporation’s MOCVD equipment division for advanced GaN and A1N devices has received the 2020 Industry Awarded from The Japan Society of Vacuum and Surface Science.
Presented annually, the award recognises significant contributions that help to advance and develop the surface and vacuum science-related industries.
TNSC has been developing MOCVD (Metal Organic Chemical Vapor Deposition) compound semiconductor production equipment since 1983 and has delivered more than 500 MOCVD equipment sets to manufacturers and research institutions around the world.
In 2012 TNSC introduced its UR26K reactor model, a large-scale mass production platform that can process 8-inch substrates. The UR series reactors optimise film properties and productivity by reducing the operating time and supporting cleaning technology for reactor components.
Later in 2015, the company developed the SR4000HT reactor model for high Al content AlGaN ultraviolet (UV) light-emitting devices. The SR4000HT allows for AlGaN film deposition at a high temperature (greater than 1300 °C).
“TNSC will continue will contribute to promote environmental and energy conservation initiatives in the industry by introducing new technologies and products,” the company said in a statement.